| | Measurement of etchdepth and – rate on semiconductor wafers … follow your etching process in realtime! |
| Realtime measurement and control of coating- and etchingprocesses on semiconductor materials like AlGaAs, GaAs, InGaAs, Si, SiN and many more. Usage in the production area or on the etching chamber in the R&D. | | 
| Your economic advantages
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| | | - Higher quality and constant processes
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| Your technical advantages
| - Constant control over etchingprocesses by automatic measurement, realtime and in-situ
| - 3D measurement with nanometer resolution without specific insulation against vibration
| - High resolution (≥ 3nm) high precision and repeatability
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| - Direct measurement of etchdepth, on every type of material
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APPLICATIONS 
